C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/302, 260/310
C07D 277/30 (2006.01) C07D 417/00 (2006.01)
Patent
CA 1237437
ABSTRACT Compounds of the formula (III): (III) Image wherein R1 is carboxy(lower)alkyl or protected carboxy(lower)- alkyl, and R6 is carboxy or protected carboxy, and salts thereof, are intermediates useful in the preparation of new cephem compounds which are active against a number of patogenic microorganisms.
508660
Takasugi Hisashi
Takaya Takao
Yamanaka Hideaki
Fujisawa Pharmaceutical Co. Ltd.
Marcoux & Sher Swabey Mitchell Houle
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