C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
96/147, 6/223, 2
C07D 303/34 (2006.01) C07F 9/09 (2006.01) C11D 1/00 (2006.01) G03C 1/38 (2006.01)
Patent
CA 1254223
-0- FLUOROSURFACTANTS CONTAINING POLYGLYCIDYL GROUPS Abstract of the Disclosure A water-soluble compound useful as a surfact- ant in photographic elements comprises a hydrophobic fluorocarbon group linked with a hydrophillc poly- glycidyl group containing an anion and cation. The compound preferably has the formula: [(YXET?)xT?]Mu wherein Y is a fluorocarbon group; X represents one or more linking groups; E is a polyglycidyl group; T1 and T2 are anionic groups; M is a cationic group and z is an integer of 1 to the maximum number of sites on E to which an anionic group is attachable; y is 0 or 1 provided that z + y is at least equal to 1; x is an integer of 1 or 2; and u is the number of cations required to neutralize the anionic groups present.
406220
Padday John F.
Pitt Allan R.
Eastman Kodak Company
Gowling Lafleur Henderson Llp
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