C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/242.01
C07D 471/04 (2006.01)
Patent
CA 1189509
Abstract Novel pyrido[2,1-b]quinazoline derivatives of the formula Image wherein R1, R2 and R3 independently represent hydrogen, lower alkanoyl or lower alkyl and R4 represents cyano, 5-tetrazolyl, halogen or a radical of the formula Image , wherein A represents hydroxy, lower alkoxy, di-(C1-C7)- alkylamino-(C2-C7)alkoxy, pivaloyloxymethoxy or -NR5R6, wherein R5 and R6 independently represent hydrogen, lower alkyl or di-(C1-C7)alkylamino-(C2-C7)alkyl, with the proviso that R4 is other than halogen when R1, R2 or R3 represents lower alkanoyl, pharmaceutically acceptable acid addition salts thereof, and when A represents hydroxy, also pharmaceutically acceptable salts thereof with a base as well as a process for preparing same. These compounds exhibit useful anti-allergic properties.
299683
Kierstead Richard W.
Tilley Jefferson W.
Gowling Lafleur Henderson Llp
Hoffmann-La Roche Limited
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