G - Physics – 02 – B
Patent
G - Physics
02
B
117/213, 6/222
G02B 1/10 (2006.01) G02B 1/11 (2006.01)
Patent
CA 1316635
ABSTRACT OF THE DISCLOSURE This invention is directed to an antireflection solution having as a main film-forming component thereof a hydrlytic derivative of a silicic ester and to a method for the treatment with the antireflection solution. The antireflection solution and the method for the treatment therewith are characterized by the fact that the hydrolytic derivative of silicic ester is obtained by causing a mixture consisting of the silicic ester and hydrolyzing water added thereto in an amount exceeding the chemical equivalent relative to the silicic ester to be hydrolyzed in the presence of a solvent compatible with both of the components of the mixture and further subjecting the resultant hydrolyzate to conversion into a colloid solution under the condition of pH 3 to 7. Owing to the characteristics mentioned above, the present invention permits the antireflection film produced by thermally solidifying an applied layer of the anti- reflection solution at a low temperature in the neighborhood of 100°C to acquire notable improvement in film properties such as resistance to defilement and adhesiveness to the substrate.
573565
Ito Optical Industrial Co. Ltd.
Kato Hirohisa
Marks & Clerk
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