C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/357, 260/362
C07C 69/73 (2006.01) C07C 37/14 (2006.01) C07C 43/178 (2006.01) C07D 309/12 (2006.01) C07F 9/32 (2006.01) C07F 9/40 (2006.01) G03C 7/392 (2006.01)
Patent
CA 1247632
Abstract of the Disclosure New Hydroquinones New hydroquinones have the formula: Image (I) wherein p is 1 or 2 and q is 0 or 1, provided that p + q is 1 or 2; R is a residue of formula: Image (II) wherein Q is selected from the residues -COZR4 wherein Z is O or NR5, -OX wherein X is R5 or -COR7, -NR8R9, -Po(OR10)[O]xR11 wherein x is O or 1, -SO2R12 or -CN, and salts thereof with organic or inorganic acid bases. The groups R1, R2, R3, R4, R5, R7, R8, R9, R10, R11, R12, k and n are defined hereafter. These compounds are used as couplers in photographic materials.
404806
Ciba Specialty Chemicals Holding Inc.
Gowling Lafleur Henderson Llp
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