Method of manufacturing optical memory element

Details Method of manufacturing optical memory element Method of manufacturing optical memory element

G - Physics

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G11B 11/10 (2006.01) G03F 7/00 (2006.01) G11B 7/24 (2006.01) G11B 7/26 (2006.01) G11B 11/105 (2006.01)

Patent

CA 1225467

- 1 - Abstract: The invention relates to a method of manufacturing an optical memory element. The method includes the steps of applying a first photo-resist layer onto a glass substrate for an optical memory element, laying a mask plate on the glass substrate applied with the first photo-resist layer, with the mask plate being prepared by covering a surface of a transparent substrate with metallic layers formed into a guide pattern configuration, irradiating ultraviolet rays onto the first photo-resist layer through the mask plate, transferring the guide patterns of the mask plate onto the first photo- resist layer, and engraving the guide patterns in the glass substrate by etching after developing the first photo-resist layer. This provides an optical memory element having a moisture and oxygen impermeable base.

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