Method and apparatus for generating ion beams

Details Method and apparatus for generating ion beams Method and apparatus for generating ion beams

H - Electricity

01

J

356/176, 358/25

H01J 27/10 (2006.01) H01J 27/14 (2006.01) H01J 37/08 (2006.01)

Patent

CA 1227289

ABSTRACT In an ion beam source, the plasma is contained near the extraction front by a cup-shaped magnetic field for improved stability and uniformity. The intermediate electrode has a profiled electron beam aperture having a first narrowest section, a second slightly wider section, and the third, known, conical section. The anode electrode or anode insert has a very narrow entrance aperture followed by outwardly flared, longer, section.

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