Sulfonium salts having acid-labile groups

Details Sulfonium salts having acid-labile groups Sulfonium salts having acid-labile groups

C - Chemistry, Metallurgy

07

C

260/447.1, 402/1

C07C 381/12 (2006.01) C07F 7/08 (2006.01) C07F 7/18 (2006.01) C08F 2/50 (2006.01) G03F 7/029 (2006.01)

Patent

CA 1333400

Sulfonium salts of the general formula Image where R1, R2 and R3 are identical or different and are aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R1 to R3 are bonded to one another to form a ring, with the proviso that one or more of the radicals R1 to R3 contain one or more acid- cleavable groups, or one of the radicals R1 to R3 is bonded to one or more further sulfonium salt radicals, if desired via acid-cleavable groups, and X- is a non- nucleophilic counter-ion, are suitable as photoinitiators for cationic polymerization.

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