C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/386, 260/335
C07F 9/6539 (2006.01) A61K 31/12 (2006.01) A61K 31/43 (2006.01) C07D 205/08 (2006.01) C07D 205/09 (2006.01) C07D 209/48 (2006.01) C07D 499/88 (2006.01) C07F 7/08 (2006.01) C07F 7/10 (2006.01) C07F 7/18 (2006.01) C07F 9/568 (2006.01) C07F 9/6558 (2006.01) C07F 9/6561 (2006.01)
Patent
CA 1268183
ABSTRACT OF THE DISCLOSURE This invention relates to phosphorane compounds of the formula Image wherein Y is hydrogen, ethyl or hydroxyethyl, Q is phenyl or (lower) alkyl, R" is an easily removable ester group and X represents certain organic substituents. Also included in the invention are pharmaceutically acceptable salts of the above compounds and derivatives of the above compounds in which the carboxyl group at the 3- position is protected by an easily removable ester protecting group. The compounds of the present invention are of use as intermediates in the preparation of penem compounds having potent antibacterial activity.
423146
Martel Alain
Menard Marcel
Bristol-Myers Squibb Company
Gowling Lafleur Henderson Llp
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