C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/396.5
C07C 255/61 (2006.01) C07C 323/63 (2006.01) C07D 257/04 (2006.01)
Patent
CA 1295336
ABSTRACT OF THE DISCLOSURE: Novel compounds of the formula: Image where R is hydrogen, lower alkyl, lower alkoxy, lower alkylthio, hydroxy or halogen; n is 0, 1 or 2, provided that when n is 2, the R substituents combined contain no more than 6 carbon atoms; and B is a carbon-carbon bond, lower alkylene, lower alkenylene, lower alkylene containing one ether or thioether link in the alkylene chain, or -?NHCH2-, are useful as synthetic intermediates for preparing certain substituted di-t-butylphenols which are anti-allergic agents.
615810
Riker Laboratories Inc.
Robic
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