Perfluoropolyethers free from peroxidic oxygen and...

Details Perfluoropolyethers free from peroxidic oxygen and... Perfluoropolyethers free from peroxidic oxygen and...

C - Chemistry, Metallurgy

07

C

402/260, 260/369

C07C 69/708 (2006.01) C07D 303/28 (2006.01) C07D 303/38 (2006.01) C08G 59/14 (2006.01) C08G 59/34 (2006.01) C08G 65/00 (2006.01)

Patent

CA 1339316

Perfluoropolyethers having fluorinated epoxy groups positioned along their perfluoropolyether chain, and free from peroxidic oxygen, are obtained by means of a low-temperature oxidation process, in the liquid phase, with molecular oxygen and in the presence of U.V. light, of a mixture of a perfluorinated monoolefin and a perfluorinated configurated diene, and of the subsequent photochemical decomposition of the peroxy groups contained in the photooxidation product, carried out by treating the peroxy-groups-containing product with U.V. light at a temperature comprised within the range of from 0°C to 160°C. Derivatives of said epoxy containing perfluoropolyethers in which the epoxy groups have been turned into functional groups.

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