C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
23/192, 6/212
C01B 33/12 (2006.01) C08K 9/06 (2006.01) C09C 1/30 (2006.01)
Patent
CA 1307094
METHOD FOR MODIFYING THE SURFACE OF FINELY DIVIDED SILICA Abstract In the present invention, finely divided silica is treated with two types of organosilicon compounds, (i) an organosilicon compound having the general formula Image wherein R is a monovalent hydrocarbon group; n is an integer having a value of 0 to 10; and Q is an alkoxy group, halogen atom, or hydroxyl group, and (ii) an organosilicon compound having the general formula (R3Si)a-Z wherein R is a monovalent hydrocarbon group; a is 1 or 2; when a eguals 1, Z is a hydrogen atom, halogen atom, hydroxyl group, alkoxy group, -NR12' -ONR12' or -OCOR1; when a equals 2, Z is -O- or -NR1-; and R1 is the hydrogen atom or an alkyl group. The present invention characteristically affords a finely divided silica which has a high dogree of surface treatment, which provides an elevated thixotropy when mixed with organo- polysiloxane, and which provides stability in long-term storage.
539103
Kobayashi Hideki
Ohnishi Masayuki
Dow Corning Toray Silicone Company Limited
Gowling Lafleur Henderson Llp
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