Diarylnitrones

C - Chemistry – Metallurgy – 07 – C

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260/578.2, 260/4

C07C 291/02 (2006.01)

Patent

CA 1299188

RD-17148 DIARYLNITRONES Abstract of the Disclosure Diarylnitrones having the following formula are useful for near UV photolithography: Image where X is an electrom withdrawing group in the para position selected from the class consisting of -?-OR7 , -?-R7 , -?N(R7)2 , -CN , halogen, and R7 is a C(1-8) alkyl radical.

561102

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