C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/259, 260/249
C07D 239/46 (2006.01) A01N 47/36 (2006.01) C07D 239/48 (2006.01) C07D 239/52 (2006.01) C07D 239/56 (2006.01) C07D 251/46 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1231948
Case 5-13494/1+2/= N-Phenylsulfonyl-N'-pyrimidinyl- and -triazinyl-ureas Abstract N-Phenylsulfonyl-N'-pyrimidinyl- and -triazinyl- ureas of the general formula Image and the salts of these compounds with amines, alkali metal or alkaline earth metal bases or quaternary ammonium bases have good pre-emergence and post-emergence selective herbi- cidal properties and growth-regulating properties. In this formula, A is a C1-C6-alkyl radical which is substituted by halogen, C1-C4-alkoxy, C1-C4-alkylthio, C1-C4-alkylsulfinyl, C1-C4-alkylsulfonyl, C1-C4- halogenoalkoxy, C1-C4-halogenoalkylthio, C1-C4-halogeno- alkylsulfinyl or C1-C4-halogenoalkylsulfonyl, or is a C2- C6-alkenyl radical substituted by the above radicals, E is the methine group or nitrogen, X is oxygen, sulfur or a sul- finyl or sulfonyl bridge, Z is oxygen or sulfur, m is the number one or two, R1 is hydrogen, halogen, C1-C5-alkyl, C2-C5-alkenyl or a -Y-R5 radical, R2 is hydrogen, halogen, C1-C5-alkyl, C1-C5 alkenyl, C1-C4-halogeno- alkyl or a -Y-R5, -COOR6, -N02 or -CO-NR7-R8 radical, R3 is hydrogen, C1-C4-alkyl, C1-C4-alkoxy, C1-C4- alkylthio, C1-C4-halogenoalkyl, halogen, C1-C4-halogeno- alkoxy or alkoxyalkyl having not more than 4 carbon atoms, R4 is C1-C4-halogenoalkoxy or C1-C4-halogenoalkylthio, R5 and R6 are each C1-C5-alkyl, C2-C5-alkenyl or C2-C6-alkynyl, R7 and R8 independently of one another are hydrogen, C1-C5-alkyl, C2-C5-alkenyl or C2-C6- alkynyl and Y is oxygen, sulfur or a sulfinyl or sulfonyl bridge, and A can also be an unsubstituted C2-C6- alkenyl radical if X is simultaneously oxygen.
408671
Fory Werner
Meyer Willy
Fetherstonhaugh & Co.
Syngenta Participations Ag
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