C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/249, 400/708
C07D 491/113 (2006.01) C07D 491/10 (2006.01) C07D 519/00 (2006.01) C08K 5/34 (2006.01) C08K 5/3492 (2006.01)
Patent
CA 1181401
ABSTRACT OF THE DISCLOSURE; Synthetic resin compositions having an improved resistance to deterioration upon exposure to light comprising a 2, 2, 6, 6-tetramethyl pipe ridinyl triazine having one of the formulae (I), (II) and (III): Image I (ii) Image II Image III wherein: (iii) R1 is selected from the group consisting of hydrogen, oxyl O; alkyl, alkenyl and hydroxyalkyl having from one to about twelve carbon atoms, phenalkyl having from seven to about twelve carbon atoms and acyloxyalkyl having from two to about twelve carbon atoms; and 2,3-epoxypropyl; R2 is selected from the group consisting of hydrogen, lower alkyl having from one to about five carbon atoms, Image and -O- R3 (wherein R is hydrogen or lower alkyl having from one to about five carbon atoms; and R3 is hydrogen or acyl having from one to about twenty carbon atoms); X is selected from the group consisting of Image ; -O-R6; and Image (iv) R4 is selected from the group consisting of hydrogen, alkyl having from one to about eighteen carbon atoms, aryl having from six to about fifteen carbon atoms, -(CH2)p-O-R3 and Image R5 is selected from the group consisting of R4 and Image ; R6 is selected from the group consisting of alkyl having from one to about eight carbon atoms, aryl having from six to about ten carbon atoms and Image R7 is selected from the group consisting of hydrogen, alkyl having from one to about eight carbon atoms and acyl having from about two to about five carbon atoms; (v) R8 is selected from the group consisting of direct linkage, alkylene having from about two to about twelve carbon atoms; arylene having from six to about ten carbon atoms; Image ; R9 is selected from the group consisting of hydrogen, alkyl having from one to about eight carbon atoms, aryl having from six to about ten carbon atoms,and acyl having from about two to about ten carbon atoms; R10 is selected from the group consisting of alkylene having from one to twelve carbon atoms and arylene having from six to ten carbon atoms; Y is selected from the group consisting of X, Image , Image and a more than three valent residue derived from a polyalcohol or a polyamine by elimination of active H atoms thereof, i.e., Image ; Z is selected from the group consisting of Image , Image ; (vi) q = 1 to 20; R11 is selected from the group consisting of alkylene having from two to about eight carbon atoms, alkylene cycloalkylene having from seven to about eighteen carbon atoms, and arylene having from six to about ten carbon atoms; n1 is 1, 2 or 3; n2 is a number from 1 to 50; m1 is a number from 1 to 20; m2 is a number from 2 to 20; r is a number from 1 to 48.
411383
Minagawa Motonobu
Nakahara Yutaka
Shibata Toshihiro
Adeka Argus Chemical Co. Ltd.
Gowling Lafleur Henderson Llp
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