Substrate of the silicon on insulator type for the...

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H01L 29/72 (2006.01) H01L 21/20 (2006.01) H01L 21/762 (2006.01) H01L 21/84 (2006.01) H01L 29/772 (2006.01)

Patent

CA 2200264

Process for the preparation of a substrate of the silicon on insulator type for the production of transistors. The process comprises the following stages: a) shaping the surface of a silicon substrate (10) in order to define a first region (20) and a second region (22) forming a depression with respect to the first region (20), b) formation in the first (20) and second (22) regions of a buried silicon oxide layer (26), which is level with the surface of a transition flank between the regions, c) elimination of the silicon oxide layer (26) level with the flank, d) epitaxying a silicon layer (32) on the first and second regions (20, 22) and on the transition flank, e) levelling the epitaxial layer (32) stopping at the silicon oxide layer (26).

Méthode de préparation d'un substrat de type silicium sur isolant pour la production de transistors. Le procédé comprend les étapes suivantes : a) façonner la surface d'un substrat au silicium (10) de façon à définir une première région (20) et une seconde région (22) formant une dépression par rapport à la première (20); b) former une couche d'oxyde de silicium enfoui dans la première (20) et la seconde (22) régions, qui soit au même niveau que la surface d'une couche de transition entre les régions; c) éliminer la couche d'oxyde de silicium (26) au niveau de la couche de transition; d) épitaxier une couche de silicium (32) sur la première et la seconde régions (20, 22) et sur la couche de transition; e) mettre au niveau la couche épitaxiale (32) s'arrêtant à la couche d'oxyde de silicium (26).

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