Method and apparatus for epitaxially growing a material on a...

C - Chemistry – Metallurgy – 30 – B

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C30B 25/14 (2006.01) C30B 25/02 (2006.01)

Patent

CA 2373170

A method of epitaxially growing a material on a substrate (1). The method comprises separately heating precursors to their respective decomposition temperatures at or adjacent a region of the substrate to generate species which are supplied separately to the region and which combine at the region.

L'invention concerne un procédé permettant de générer une croissance épitaxiale d'un matériau sur un substrat (1). Ce procédé consiste à chauffer séparément des précurseurs à leur température de décomposition respective dans une région ou à proximité d'une région du substrat, de manière à générer des espèces qui sont apportées séparément dans cette région et qui se combinent ensuite dans cette dernière.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for epitaxially growing a material on a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for epitaxially growing a material on a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for epitaxially growing a material on a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1350051

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.