Method for preparing lithographically sensitive branched...

Details Method for preparing lithographically sensitive branched... Method for preparing lithographically sensitive branched...

C - Chemistry, Metallurgy

08

G

96/172, 402/50

C08G 8/16 (2006.01) C08G 8/08 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2014644

PATENT APPLICATION of LEONARD EDWARD BOGAN,Jr, for METHOD FOR PREPARING LITHOGRAPHICALLY SENSITIVE BRANCHED NOVOLAXS DN 88-27 MSA:vjc ABSTRACT OF THE DISCLOSURE A method for preparing branched novolak polymers possessing excellent lithographic performance is provided. The method involves the acid catalyzed reaction of a phenol with a tris- or tetrakis(dialkylaminoalkyl)phenol followed by purification of the reaction product. The branched novolaks are soluble in aqueous base and organic solvent solutions and are particularly useful as the polymeric component of either positive acting or negative acting photoresist compositions. EXPRESS MAIL LABLE NO. B016 879 68Y ,. ~ . ',............ .

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