Integrated etched multilayer grating based wavelength...

Details Integrated etched multilayer grating based wavelength... Integrated etched multilayer grating based wavelength...

G - Physics

02

B

G02B 5/18 (2006.01) G02B 26/08 (2006.01) H04J 14/02 (2006.01)

Patent

CA 2564658

An integrated etched multilayer grating-based wavelength multiplexer / demultiplexer is disclosed wherein an etched multilayer grating structure is monolithically integrated within the optical waveguide stack of the multiplexer / demultiplexer to reflectively diffract an input optical beam. The multilayer grating structure is generally comprised of a series of etched diffractive elements and an etched multilayer reflector, the combined optical response of which providing the desired multiplexing / demultiplexing effect. The etched structures are generally comprised of shallow etch structures in a top surface of the multiplexer / demultiplexer waveguide stack. Monolithically integrated input and output ridge waveguides may also be provided, optionally fabricated in a same etching step as the etched multilayer grating.

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