Nanostructured thin films and their uses

Details Nanostructured thin films and their uses Nanostructured thin films and their uses

B - Operations, Transporting

01

D

B01D 59/44 (2006.01)

Patent

CA 2578359

The present invention generally discloses the use of a nanostructured non- silicon thin film (such as an alumina or aluminum thin film) on a supporting substrate which is subsequently coated with an active layer of a material such as silicon or tungsten. The base, underlying non-silicon material generates enhanced surface area while the active layer assists in incorporating and transferring energy to one or more analytes adsorbed on the active layer when irradiated with a laser during laser desorption of the analyte(s). The present invention provides substrate surfaces that can be produced by relatively straightforward and inexpensive manufacturing processes and which can be used for a variety of applications such as mass spectrometry, hydrophobic or hydrophilic coatings, medical device applications, electronics, catalysis, protection, data storage, optics, and sensors.

L'invention concerne généralement l'utilisation d'un film fin nanostructuré sans silicium (tel qu'un film fin en alumine ou aluminium) situé sur un substrat de soutien recouvert ensuite d'une couche active d'un matériau tel que silicium ou tungstène. Le matériau de base sous-jacent sans silicium génère une surface active améliorée alors que la couche active soutient l'incorporation et le transfert d'énergie à un ou plusieurs analytes adsorbés sur la couche active lorsqu'ils sont soumis à un rayonnement laser durant la désorption laser du ou des analytes. L'invention concerne des surfaces de substrat pouvant être produites au moyen de procédés relativement simples et peu coûteux, et pouvant être utilisées pour diverses applications telles que spectrométrie de masse, revêtements hydrophobes ou hydrophiles, applications de dispositifs médicaux, électronique, catalyse, protection, stockage de données, optique et capteurs.

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