C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/305, 260/313
C07D 249/08 (2006.01) A01N 43/50 (2006.01) A01N 43/653 (2006.01) C07D 233/56 (2006.01) C07D 303/04 (2006.01) C07D 303/08 (2006.01) C07D 303/22 (2006.01) C07D 303/34 (2006.01) C07D 401/12 (2006.01) C07D 405/00 (2006.01) C07D 405/06 (2006.01) C07D 405/08 (2006.01) C07D 407/04 (2006.01) C07D 407/06 (2006.01) C07D 409/00 (2006.01) C07D 493/10 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2032285
- 121 - O.Z. 0050/41291 Abstract of the Disclosure: Azolylmethylcycloalkanols of the general formula I Image (I) where R1 and R5 are identical or different and are each hydrogen or alkyl; R1 and R5 together are >CH=CH-R7 or >CH-Z-R7, where Z is CH2, O, S, SO, SO2 or N-R8; R7 is alkyl, phenyl, biphenyl, naphthyl, heteroaryl, benzyl or cycloalkyl, where each of these radicals may be substituted, or is tetrahydropyranyl; R2 and R3 are each hydrogen or alkyl, or, where R1 and R5 are >CH=CH-R7, R2 and R3 together may additionally be =CH-R7; R4 and R6 are each hydrogen or alkyl, or R3 and R4 together with the carbon atoms on which they are substituents are a saturated or unsaturated 5-membered or 6-membered carbocyclic ring, or R2, R3, R4 and R9 together with the carbon atoms on which they are substituents are an unsubstituted or halogen- substituted phenyl ring, or where R1 and R5 are >C=CH-R7, R2 and R3 together may additionally be =CH-R7; R8 and R9 to R12 are each hydrogen, alkyl, phenyl, bi- phenyl, naphthyl, heteroaryl, benzyl, dioxolanyl or cycloalkyl, where each of these radicals may be substituted; T is (CH2)n, =CR11R12, O or S; n is an integer from 1 to 5, with the proviso that R1 to - 122 - O.Z. 0050/41291 R12 are not simultaneously hydrogen, and with the proviso that R1 and R5 together are not Image or Image when R2 to R4 and R6 to R12 are hydrogen, and X is CH or N, and plant-tolerated acid salts and metal complexes thereof, and growth regulators and fungicides containing these compounds.
Ammermann Eberhard
Goetz Norbert
Harreus Albrecht
Keil Michael
Kober Reiner
Basf Aktiengesellschaft
Robic
LandOfFree
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