C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/292.2, 260/2
C07D 211/06 (2006.01) A01N 33/04 (2006.01) A01N 33/10 (2006.01) A01N 43/10 (2006.01) A01N 43/84 (2006.01) C07D 211/14 (2006.01) C07D 211/52 (2006.01) C07D 265/30 (2006.01) C07D 295/03 (2006.01)
Patent
CA 2007171
O.Z. 0050/40498 ABSTRACT OF THE DISCLOSURE: Phenylalkylamines of the formula Image I where n is 5, 6, 7, 8 or 9, m is 1, 2 or 3, R1 is methyl, halogen, substituted or unsubstituted aryl or substituted or unsubstituted phenoxy, and, when m is 2, two adjacent radicals R1 together denote the radical Image , X is oxygen, except when R1 is methyl, or the radical Image , R4 is isopropyl, tert-butyl or substituted or unsubstituted phenyl and R5 is H or OH, R2 and R3 are each hydrogen and, when X is oxygen, R2 and R3 additionally denote methyl or ethyl, and their plant-tolerated salts, and fungicides containing these compounds.
Ammermann Eberhard
Buschmann Ernst
Lorenz Gisela
Zipplies Matthias
Basf Aktiengesellschaft
Robic Robic & Associes/associates
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