An optical device for observing the millimetric or...

G - Physics – 01 – B

Patent

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G01B 21/20 (2006.01) G01B 11/25 (2006.01) G01N 21/95 (2006.01) G01N 21/956 (2006.01) G01B 11/30 (2006.01)

Patent

CA 2701218

A device for observation, by reflection, of the structural details of an object (2) that exhibits a behaviour that is at least partially specular, located in an exposure area, which includes: at least one radiation source with an emission surface (6) possessing at least two distinct zones (26, 27) emitting streams of radiation, where at least one of the characteristics differs from one zone to the next; an optical projection system that is located in line with the radiation source in relation to the exposure zone, in the path of the radiation; an optical exposure system (18) designed to optically link the entry aperture (14) of the optical projection system and the emission surface (6); a projection surface (10) that is linked optically with the object in the exposure zone, and whose received radiation depends on the deflection on the object (2).

L'invention porte sur un dispositif permettant l'observation, par réflexion, des détails structurels d'un objet (2) qui présente un comportement au moins partiellement spéculaire et qui est situé dans une zone d'exposition. Ce dispositif comprend au moins une source de rayonnement avec une surface d'émission (6) possédant au moins deux zones distinctes (26, 27) émettant des flux de rayonnement, au moins une des caractéristiques diffèrant d'une zone à l'autre, un système de projection optique qui est aligné à la source de rayonnement par rapport à la zone d'exposition, dans le trajet du rayonnement, un système d'exposition optique (18) mis au point pour lier optiquement l'ouverture d'entrée (14) du système de projection optique et la surface d'émission (6), une surface de projection (10) qui est liée optiquement à l'objet dans la zone d'exposition, et dont le rayonnement reçu dépend de la déviation sur l'objet (2).

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