C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 225/16 (2006.01) A61K 31/135 (2006.01) A61K 31/275 (2006.01) A61K 31/395 (2006.01) C07C 49/813 (2006.01) C07C 215/30 (2006.01) C07C 237/30 (2006.01) C07C 255/58 (2006.01) C07C 259/10 (2006.01) C07D 295/112 (2006.01) C07D 317/28 (2006.01)
Patent
CA 2044533
RAN 4450/64 Abstract Antimycotically-active compounds of the general formula Image I wherein R1 and R2 each signify hydrogen, C1-7-alkyl or C2-7- alkenyl or together signify straight-chain C2-4-alkylene, R3 and R4 each signify hydrogen or C1-7-alkyl, R5 and R6 each signify hydrogen, halogen, trifluoromethyl, nitro, cyano, C1- 7-alkoxy or C1-7-alkyl and Q signifies a phenyl or naphthyl group, which is unsubstituted or mono- or multiply- substituted by halogen, trifluoromethyl, cyano, nitro, C1-7- alkyl or C1-7-alkoxy, or a C1-10-alkyl group, which can be substituted by one or more hydroxy groups, or a C2-l0- alkenyl group, and their pharmaceutically acceptable acid addition salts.
Guerry Philippe
Jolidon Synese
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
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