Positive type resist composition

Details Positive type resist composition Positive type resist composition

G - Physics

03

F

G03F 7/039 (2006.01) C08G 8/04 (2006.01) G03F 7/022 (2006.01) G03F 7/023 (2006.01)

Patent

CA 2089634

ABSTRACT OF THE DISCLOSURE A positive type resist composition comprising an alkali-soluble resin and a quinonediazide compound, wherein the alkali-soluble resin containing resin (A) is obtainable through a condensation reaction with at least one phenol compound represented by the following general formula (I): Image ( I ) wherein R1 to R3 independently to one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one compound represented by the following general formula (II): Image (II) wherein R4 represents a hydrogen atom, an alkyl group having 1-4 carbon atoms or a phenyl group, R5 to R7 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and n represents 1 or 2, and an aldehyde compound. This composition is excellent in the balance between perform- ances such as sensitivity, heat resistance and profile, and is free from scum.

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