Dicopper (i) oxalate complexes as precursor for metallic...

Details Dicopper (i) oxalate complexes as precursor for metallic... Dicopper (i) oxalate complexes as precursor for metallic...

C - Chemistry, Metallurgy

07

F

C07F 1/08 (2006.01)

Patent

CA 2525521

The invention relates to dicopper (I) oxalate complexes, stabilised by means of neutral Lewis bases, such as alkenes or alkynes and the use of dicopper (I) oxalate complexes as precursor for metallic copper deposition in which alkynes, alkenes, triarylphosphines, CO and isonitriles are used as neutral Lewis bases.

L'invention concerne des complexes d'oxalate de dicuivre(I) stabilisés par des bases de Lewis neutres telles que des alcènes ou des alcynes ainsi que l'utilisation de complexes d'oxalate de dicuivre(I) comme précurseurs pour le dépôt de cuivre métallique, dans lesquels des alcynes, des alcènes, des triarylphosphines, CO et des isonitriles sont utilisés comme bases de Lewis neutres.

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