Method for production of polycrystalline silicon

C - Chemistry – Metallurgy – 01 – B

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C01B 33/035 (2006.01)

Patent

CA 2722068

The invention relates to a polycrystalline silicon production method. The inventive method involves supplying a gas mixture based on a silicon-containing gas to a reduction reactor via a tube system and precipitating silicon on heated surfaces in such a way that an effluent gas mixture is formed. The silicon precipitation process is simultaneously carried out in at least two reactors which are connected in series by the tube system for transporting the gas mixture. Then, the gas mixture used for the operation of all the reactors is supplied at entry into the first reactor and is continuously transmitted through all the connected in series reactors.

L'invention concerne un procédé de fabrication de silicium polycristallin par sédimentation à partir de la phase gazeuse. Selon l'invention, on alimente un réacteur de réduction au moyen d'un système de tuyaux de mélange gazeux à base d'un gaz contentant du silicium, et on assure la sédimentation du silicium sur des surfaces réchauffées tout en formant des gaz d'évacuation. Le processus de sédimentation est mis en oeuvre simultanément dans au moins deux réacteurs qui sont reliés entre eux en série par un système de tubulures pour le transport du mélange gazeux. On alimente ensuite l'entrée du premier réacteur avec un mélange gazeux destiné au fonctionnement de tous les réacteurs et on assure la circulation ininterrompue du mélange gazeux à travers tous les réacteurs reliés en série.

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