Production of photoresist coatings

H - Electricity – 05 – K

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H05K 3/00 (2006.01) G03F 7/16 (2006.01) G03F 7/38 (2006.01) G03F 7/40 (2006.01)

Patent

CA 2357001

Process for the production of a resist coating, in which (a) a substrate is coated with a resist composition which comprises at least one component which absorbs radiation in the near infrared region with warming of the coating; and (b) the resist composition or a composition derived therefrom and obtained during the process is subjected at least once during the process to thermal treatment with the aid of radiation in the near infrared region.

Procédé d'obtention d'une couche de photorésist, caractérisé (a) en ce qu'on enduit un substrat d'une composition de résist renfermant au moins un composant qui absorbe le rayonnement dans la zone du proche infrarouge avec échauffement de la couche et, (b) en ce que la composition de résist ou une composition qui en dérive, obtenue durant le procédé, est soumise, lors du procédé, au moins une fois, à un traitement thermique, au moyen d'un rayonnement dans la zone du proche infrarouge.

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