C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 211/49 (2006.01) C07C 237/30 (2006.01) C07D 209/48 (2006.01) C07H 19/04 (2006.01) G01N 33/58 (2006.01) G01N 33/84 (2006.01)
Patent
CA 2395311
Compounds capable of forming an intramolecular exciplex on photoirradiation of the compound in water comprise two exciplex forming partners, one being a donor moiety and the other an acceptor moiety, each having at least one aromatic nucleus and being connected by a saturated aliphatic chain having the flexibility to allow said partners to come into exciplex forming relationship. The compounds may be used as labels for oligonucleotides. Certain of the compounds display pH sensitive emission.
L'invention concerne des composés capable de former un exciplexe intramoléculaire par photoirradiation du composé dans l'eau comprenant deux exciplexes formant des partenaires, l'un d'eux étant une fraction donneuse et l'autre une fraction acceptrice, chacun présentant au moins un noyau aromatique et étant relié par une chaîne aliphatique saturée possédant la flexibilité nécessaire aux partenaires pour se mettre en relation de formation exciplexe. Les composés peuvent être utilisés comme marqueurs pour des oligonucléotides. Certains des composés présentent une émission sensible au pH.
Bichenkova Elena Vladimirovna
Douglas Kenneth Thomas
Sardarian Ali
Marks & Clerk
The Victoria University Of Manchester
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