C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 413/12 (2006.01) A61K 31/445 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) C07D 271/06 (2006.01) C07D 413/14 (2006.01) C07D 453/02 (2006.01)
Patent
CA 2126976
2126976 9313083 PCTABS00024 Heterocyclic compounds of the formula: R1-Q-Z-X-A-M, wherein R1 is lower alkyl, a heterocyclic group which may have suitable substituent(s), etc; Q is oxadiazolediyl, Z is bond or vinyl, X is bond, a group of formula (a), (in which R4 is hydrogen or lower alkyl), a group of formula (b), (in which R8 is hydroxy or protected hydroxy), etc; A is bond, lower alkylene or lower alkynylene and M is a heterocyclic group containing at least one nitrogen atom which may have one substituent selected from the group consisting of lower alkyl, an imino protective group and ar(lower)alkyl which may have suitable substituent(s), and a pharmaceutically acceptable salt thereof which are useful as a medicament.
Kuno Atsushi
Ohkubo Mitsuru
Takasugi Hisashi
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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