Plasma etching apparatus with surface magnetic fields

Details Plasma etching apparatus with surface magnetic fields Plasma etching apparatus with surface magnetic fields

H - Electricity

01

L

356/192

H01L 21/42 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2015976

ABSTRACT A glow discharge etching apparatus includes a magnetic assembly for creating a surface magnetic field in close proximity to the walls of an etching chamber. An electrode is located within the chamber for supporting the object to the etched. A radio frequency signal is applied to the electrode so that it will emit secondary electrons upon bombardment by ions from an etching plasma created within the apparatus. A control plate may be positioned at various locations within the apparatus to regulate the amount of electron leakage to the control plate and thereby regulate the etching process. This apparatus provides improved uniformity and directionality of etching due to a low gas pressure and the surface magnetic field.

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