Mask for x-ray pattern delineation

Details Mask for x-ray pattern delineation Mask for x-ray pattern delineation

H - Electricity

01

L

H01L 21/027 (2006.01) G03F 1/14 (2006.01)

Patent

CA 2090157

Fabrication of reflective masks, designed for use with x-ray delineating radiation in the construction of sub-micron devices, is expedited by use of a barrier layer intermediate the multilayer reflector and the absorber layer. The barrier is designed to reduce damage to the multilayer reflector during two stages of fabrication - during initial patterning and during subtractive or additive mask repair. Composition of the barrier is so chosen as to minimize such damage during its removal in baring of the reflector, and also as to have requisite stability in regions retained during mask life.

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