Shadow sculpted thin films

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 16/04 (2006.01) C23C 16/458 (2006.01) C23C 16/52 (2006.01) G02B 1/10 (2006.01) G02B 5/20 (2006.01) G10K 15/00 (2006.01) H01L 49/02 (2006.01) H01P 1/00 (2006.01) H03H 9/30 (2006.01) H05B 33/00 (2006.01)

Patent

CA 2591651

A method of making vapor deposited thin films by rotating a substrate in the presence of an obliquely incident vapor flux. The substrate may be rotated about an axis normal to the surface of the substrate and/or parallel to the surface of the substrate by two motors mounted with their axes orthogonal to each other. Angle of incidence, measured from the normal to the surface of the substrate, exceeds 800. Feedback from a deposition rate monitor allows control of rotation speed of both motors to produce a growth with a defined pattern.

Méthode pour créer des couches minces déposées par évaporation sous vide en faisant tourner un substrat en présence d'un flux de vapeur dirigé obliquement par rapport audit substrat. Il est possible de faire tourner le substrat autour d'un axe normal par rapport à sa surface et/ou parallèle à sa surface, au moyen de deux moteurs dont les axes sont disposés de façon orthogonale l'un par rapport à l'autre. L'angle d'incidence, mesuré à partir de l'état normal par rapport à la surface du substrat, excède 800. La rétroaction fournie par un dispositif de surveillance de cadence de dépôt permet de réguler la vitesse de rotation des deux moteurs pour obtenir un dépôt présentant une tendance définie.

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