Method and apparatus for treatment of liquid photographic...

Details Method and apparatus for treatment of liquid photographic... Method and apparatus for treatment of liquid photographic...

C - Chemistry, Metallurgy

02

F

C02F 9/00 (2006.01) C02F 1/42 (2006.01) C02F 1/46 (2006.01) C02F 1/467 (2006.01) C02F 1/78 (2006.01)

Patent

CA 2057003

2057003 9113834 PCTABS00007 A method and an apparatus for treatment of liquid wastes from photographic processes are described, in which the wastes to be treated are (a) subjected to an oxygen oxidation (3) as well as (b) an ozone oxidation (7), (c) optionally from the oxidized wastes halide ions are removed (12), (d) the wastes, from which optionally halide ions are extensively removed, are subjected to an anodic after-oxidation as well as (15) (e) a cathodic reduction (17), then (f) neutralized (19) and (g) set free from precipitated solids by filtration (22). The invention allows an especially effective reduction of damaging substances which are obtained in photographic processes.

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