Method for cleaning chamber of deposition apparatus for...

Details Method for cleaning chamber of deposition apparatus for... Method for cleaning chamber of deposition apparatus for...

C - Chemistry, Metallurgy

11

D

C11D 7/28 (2006.01) B08B 3/14 (2006.01) C11D 3/24 (2006.01) C11D 7/30 (2006.01) C11D 7/50 (2006.01) C11D 11/00 (2006.01) C23C 14/00 (2006.01) C23C 14/12 (2006.01) C23C 14/56 (2006.01) H05B 33/10 (2006.01) H05B 33/14 (2006.01) H01L 51/30 (2006.01) H01L 51/40 (2006.01) H01L 51/56 (2006.01)

Patent

CA 2489616

A compound such as Alq3 accumulated on the inner surface of a chamber at the time of organic EL device production and wasted is recovered and recycled, whereby the production cost is reduced. The inner surface of a chamber or the surface of components in the chamber to which a compound such as Alq3 has adhered is cleaned with a fluorinated alcohol such as 2,2,3,3,4,4,5,5-- octafluoropentanol to recover Alq3.

L'invention concerne la récupération et la réutilisation de composés, tels que l'Alq¿3?, accumulés sur la surface intérieure d'une chambre dans la production d'éléments EL organiques et évacués, d'où une réduction du coût de production. On nettoie la surface intérieure de la chambre ou les éléments intérieurs de la chambre sur lesquels l'Alq¿3? et d'autres composés sont collés au moyen d'un alcool fluoré, tel que le 2,2,3,3,4,4,5,5-octafluoropentanol, ce qui permet de récupérer l'Alq¿3?.

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