Method for forming a step on a deposition surface of a...

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

H01L 39/24 (2006.01)

Patent

CA 2135500

The present invention relates to a method for forming a step on a deposition surface of a substrate for depositing a thin film on it. The method comprises steps of etching a portion of the deposition surface of the substrate and conducting heat treatment of the substrate so as to recover crystallinity of the etched surface. The method can comprise steps of etching a portion of the deposition surface of the substrate and further etching the etched portion of the deposition surface of the substrate slightly so as to remove a degraded surface.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming a step on a deposition surface of a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming a step on a deposition surface of a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a step on a deposition surface of a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1562075

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.