C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/26 (2006.01) C23C 16/01 (2006.01) C23C 16/27 (2006.01) C23C 16/56 (2006.01) C23G 1/10 (2006.01)
Patent
CA 2065724
RD-21,034 An Improved Method of Producing Articles by Chemical Vapor Deposition and The Support Mandrels Used Therein An improved method of producing a diamond tube by chemical vapor deposition and a hollow support mandrel used therein. The method comprises depositing a diamond film on an outer side of the hollow mandrel by the CVD process. The mandrel is then etched away by subjecting an inner side of the mandrel to the etching action. It was unexpectedly discovered that the etch time is drastically reduced by using the hollow mandrels.
Anthony Thomas R.
Ettinger Robert H.
Fleischer James F.
Company General Electric
Craig Wilson And Company
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