C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 3/12 (2006.01)
Patent
CA 2484534
The plating bath for the deposition of satin nickel deposits according to the present invention contains at least one quaternary ammonium compound and at least one polyether, the at least one polyether having at least one strongly hydrophobic side chain. As compared to prior art plating baths, this acid plating bath has the advantage that it enables a long period of operation or heating and cooling cycles or filtration cycles, makes it possible to perform the filtration needed for continually operating the bath without using active carbon, requires a lower concentration of nickel than prior art baths to produce the satin gloss finish and has a reduced sensitivity to wetting agents that have been dragged in.
L'invention concerne un bain d'électrodéposition de nickel satiné, ce bain contenant au moins un composé d'ammonium quaternaire et au moins un polyéther doté d'au moins une chaîne latérale fortement hydrophobe. Comparativement au bains d'électrodéposition de l'art antérieur, ce bain d'électrodéposition acide a l'avantage de permettre une longue durée de fonctionnement, des cycles de chauffage et de refroidissement ou des cycles de filtration. Il est alors possible d'effectuer la filtration requise pour utiliser le bain en continu sans charbon actif. Ledit bain nécessite une moindre concentration de nickel que les bains de l'art antérieur pour produire une finition lustrée satinée, et il est moins sensible aux agents mouillants introduits.
Dahms Wolfgang
Moritz Thomas
Schulz Klaus-Dieter
Atotech Deutschland Gmbh
Riches Mckenzie & Herbert Llp
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