C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 323/66 (2006.01) C07C 309/63 (2006.01) C07C 309/66 (2006.01) C07C 309/73 (2006.01) C07C 309/75 (2006.01) C07C 323/62 (2006.01) C07C 381/00 (2006.01) C07D 311/18 (2006.01) C08J 3/24 (2006.01) C09D 11/10 (2006.01) G03F 7/004 (2006.01) G03F 7/038 (2006.01) G03F 7/039 (2006.01)
Patent
CA 2189110
The invention relates to the use of oximesulfonic acid esters of formula I Image (I), wherein m is 0 or 1 and x is 1 or 2; R1 is, for example, substituted phenyl, R2 has, for example, one of the meanings of R1 or is unsubstituted phenyl, C1-C6alkanoyl, unsubstituted or substituted benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; or R1 and R2, if necessary together with the CO group, form a ring, R3, when x is 1, is, for example, C1-C18alkyl, phenyl or phenanthryl, the radicals phenyl and phenanthryl being unsubstituted or substituted, or R3, when x is 2, is, for example, C2-C12alkylene, phenylene or oxydiphenylene, the radicals phenylene and oxydiphenylene being unsubstituted or substituted, as latent acid donors, especially at wavelengths over 390 nm, and to the use of the compounds in the production of photoresists.
Dietliker Kurt
Kunz Martin
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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