Multilayer structure and process for producing the same

Details Multilayer structure and process for producing the same Multilayer structure and process for producing the same

B - Operations, Transporting

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252/110, 88/122,

B01J 21/06 (2006.01) B01J 35/00 (2006.01) B01J 37/34 (2006.01) C03C 17/245 (2006.01) C23C 14/34 (2006.01) G02B 1/10 (2006.01)

Patent

CA 2314287

A conductive sinter obtained from a mixture of titanium oxide particles and 2.5% by weight niobium oxide particles is used as a target in direct current sputtering to form a photocatalytically active film mainly comprising titanium oxide on a glass substrate. The target has a surface resistance of 500 .OMEGA./~ or lower and the sputtering is conducted while heating the substrate at 230°C. The photocatalytically active film is based on an amorphous matrix. This process is free from problems of a conventional process in which a photocatalytically active titanium oxide film is deposited by reactive sputtering using titanium metal as a target. The problems are that the substrate needs to be heated to 350°C or higher and that the deposited film does not have high photocatalytic activity.

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