Process for the manufacture of azatetracyclic compounds

C - Chemistry – Metallurgy – 07 – D

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C07D 223/14 (2006.01) C07D 223/22 (2006.01) C07D 223/32 (2006.01) C07D 313/14 (2006.01) C07D 333/74 (2006.01) C07D 337/14 (2006.01) C07D 487/00 (2006.01) C07D 487/04 (2006.01) C07D 491/04 (2006.01) C07D 495/04 (2006.01) C07D 495/14 (2006.01)

Patent

CA 1104566

ABSTRACT OF THE DISCLOSURE Process for the manufacture of new azatetracyclic compounds of the formula Image (I) wherein R1 represents hydrogen, lower alkyl, cycloalkyl-lower alkyl of not more than 10 carbon atoms, lower alkenyl, lower alkynyl, (di-lower alkylamino)-lower alkyl, hydroxy lower alkyl, alkoxy lower alkyl, alkanoyloxy lower alkyl, lower alkylthio-lower alkyl, phenyl-lower alkyl, or phenyl-lower alkyl substituted by halogen with an atomic number up to 35, lower alkyl, lower alkoxy, methylenedioxy, or trifluoromethyl, the ring A is unsubstituted or substituted by halogen with an atomic number up to 35, lower alkyl, hydroxyl, lower alkoxy, alkanoyloxy, lower alkylthio, trifluoromethyl or cyano, Y represents a direct bond, Z represents vinylene and X represents O, S, methylene, a direct bond or a divalent radical of the partial formula Image (Ia) in which R3 represents hydrogen or lower alkyl, or Y represents a direct bond, Z represents S and X represents a direct bond or S, and acid addition salts thereof. The novel compounds possess valuable pharmaceutical properties and can be used as tranquillizing, antipsychotic and excitation- inhibiting compounds for the treatment of states of agitation.

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