Substituted sulfonylureas

C - Chemistry – Metallurgy – 07 – D

Patent

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260/259, 71/7.25

C07D 239/47 (2006.01) A01N 47/36 (2006.01) C07D 251/12 (2006.01) C07D 521/00 (2006.01)

Patent

CA 2003588

O.Z. 0050/40504 ABSTRACT OF THE DISCLOSURE: Substituted sulfonylureas of the formula I Image I, where the substituents and indices have the following meanings: X is oxygen or sulfur; Z is nitrogen or methine (= CH-); R1 is halogen or substituted or unsubstituted C1-C4-alkoxycarbonyl or C1-C3-alkoxy, or a radical -CONR6R7, where R6 is hydrogen, C1-C8-alkyl or C1-C6-alkoxy and R7 is hydrogen or C1-C8-alkyl; R2 is halogen or substituted or unsubstituted C1-C4-alkoxy or C1-C4-alkyl; R3 is C1-C4-alkyl, C1-C4-alkoxy, C1-C4-alkylthio, C1-C4-haloalkyl, C1-C4-haloalkoxy, C1-C4-haloalkylthio, halogen, cyano, nitro, amino, mono-C1-C4-alkylamino, di-C1-C4-alkylamino, C2-C6-alkenyl, C1-C4-alkoxycarbonyl, Cl-C4-alkanoyl or benzyl; a 5- or 6-member- ed saturated heterocycle which is attached by its nitrogen atom and which, besides methylene and a nitrogen, may also contain an oxygen or a sulfur atom; or, bonded to adjacent ring positions, -OCRR'O-, where R and R' are each hydrogen or C1-C4-alkyl; R4 is hydrogen or C1-C4-alkyl; R5 is halogen, C1-C4-alkyl, C1-C4-alkoxy, C1-C4-alkylthio or C1-C4-haloalkyl; m is from 0 to 3 or, when R3 is halogen, from 0 to 5, differences among the R3 radicals being possible when m is 2 or 3; and n is from 0 to 2, a difference between the R5 radicals being possible when n is 2; and environmentally acceptable salts thereof, processes for their manufacture, and their use as herbicidal agents.

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