C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 401/14 (2006.01) A61K 31/435 (2006.01) A61K 31/495 (2006.01) C07D 413/14 (2006.01)
Patent
CA 2106728
ABSTRACT OF THE DISCLOSURE Compounds of the formula Image wherein R1 is selected from Image , Image , Image , or Image Y is a bond or lower alkylene; R2 and R3 are independently hydrogen, lower-alkyl or halogen; R4 is Image , Image , COOR9 or Image R5 is hydrogen, lower-alkyl or halogen; R6 is hydrogen, lower-alkyl or halogen; R7 is hydrogen or lower-alkyl; R8 is hydrogen, lower-alkyl, or trifluoromethyl; R9 is lower-alkyl; R10 is lower-alkyl, trifluoromethyl or difluoromethyl; or pharmaceutically acceptable acid addition salts thereof are useful as antiviral agents.
Fetherstonhaugh & Co.
Sanofi-Synthelabo
LandOfFree
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