Device for fast and uniform heating of a substrate with...

Details Device for fast and uniform heating of a substrate with... Device for fast and uniform heating of a substrate with...

H - Electricity

01

L

H01L 21/00 (2006.01)

Patent

CA 2394426

The invention concerns a heating device comprising infrared radiation lamps (24, 26) for providing a fast heat treatment of a substrate (12) inside a reaction chamber (14) with transparent window (34). The infrared lamps (24, 26) are distributed on two superimposed stages (A, B) extending on a common side of the substrate (12), the lamps (24) of the lower stage (A) being arranged perpendicular relative to the lamps (26) of the upper stage (B). Means adjusting power input for each unit of lamps provide more heat on the edges than at the centre of the substrate (12). A reflector (36) is configured as a distribution grid (38) designed to reflect the infrared radiation to control the power ratios between the different heating zones. Thus the substrate (12) is uniformly heated, whatever its shape and its dimensions.

Un dispositif de chauffage comprend des lampes à rayonnement infrarouge 24, 26 destinées à assurer un traitement thermique rapide d'un substrat 12 à l'intérieur d'une chambre de réaction 14 à hublot 34 transparent. Les lampes à infrarouge 24, 26 sont réparties sur deux étages A, B superposés en s'étendant d'un même côté du substrat 12, les lampes 24 de l'étage inférieur A étant disposées perpendiculairement par rapport aux lampes 26 de l'étage supérieur B. Des moyens de réglage de la puissance d'alimentation par groupes de lampes assurent un chauffage plus important sur les bords qu'au centre du substrat 12. Un réflecteur 36 est conformé selon une grille de répartition 38 destinée à réfléchir le rayonnement infrarouge pour contrôler les ratios de puissance entre les différentes zones de chauffe. Il en résulte un chauffage uniforme du substrat 12, indépendamment de sa géométrie et de ses dimensions.

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