Photosensitive composition including a halogen- containing...

Details Photosensitive composition including a halogen- containing... Photosensitive composition including a halogen- containing...

G - Physics

03

C

96/161, 96/44

G03C 1/52 (2006.01) G03F 7/022 (2006.01) G03F 7/105 (2006.01)

Patent

CA 1097124

K-2485 PHOTOSENSITIVE COMPOSITION Abstract of the Disclosure This invention relates to a photosensitive composition compris- ing an ester or an amide of an o-naphthoquinone diazide sulfonic or carboxylic acid and, based upon the amount of this compound, about 1 to 50 per cent by weight of an organic dye capable of salt formation, and about 5 to 75 per cent by weight of a photosensitive halogen- containing diazonium salt which releases acid upon exposure to light and having the general formula I Image in which Ra is selected from the group consisting of hydrogen, halogen, an alkyl, alkoxy, aryl, arylmercapto, aryloxy, arylamino or benzoyl- amino group, Rb and/or Rc-are selected from the group consisting of hydro- gen, alkyl, alkoxy or aryloxy, alkylmercapto or arylmercapto groups, A is selected from the group consisting of PF6, BF4, AsF6, SbC16, SnC16, BiC15, ZnC14 or SbF6, and x is 1 or 2, with Ra and Rc simultaneously not being hydrogen.

286369

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