Method for manufacturing a photonic crystal device provided...

G - Physics – 01 – N

Patent

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G01N 21/65 (2006.01) G02B 6/122 (2006.01)

Patent

CA 2736517

A method for .cndot. manufacturing a photonic crystal device (1) provided with a plasmonic waveguide (8) comprises the following steps: preparing a membrane (2); applying, in a programmed manner, a focused ion beam on the membrane (2), in a manner such as to obtain a photonic crystal (5) made up by a regular planar arrangement of through holes (6) positioned according to a preset lattice and also comprising a resonant cavity (7); and providing a conic plasmonic waveguide (8) at the resonant cavity, through chemical vapour deposition induced by a focused electron beam. The focused electron beam that induces la deposition is controlled in such a manner to gradually reduce the transverse section of the electron beam starting from the base up to the tip of the projecting structure, maintaining the position of the electron beam constant.

L'invention concerne un procédé de fabrication de dispositif de cristal photonique (1) pourvu d'un guide d'onde plasmonique (8) qui comprend les étapes suivantes : préparation d'une membrane (2); application, de manière programmée, d'un faisceau d'ions focalisé sur cette membrane (2), de façon à obtenir un cristal photonique (5) constitué d'un agencement plan régulier de trous traversants (6) positionnés selon un lattis prédéterminé et comprenant aussi une cavité résonnante (7); fourniture d'un guide d'onde conique (8) au niveau de la cavité raisonnante, par dépôt chimique en phase vapeur induit par un faisceau d'électrons focalisé. Le faisceau d'électrons focalisé induisant ce dépôt est commandé de manière à graduellement réduire la section transversale du faisceau d'électrons de la base à la pointe de la structure faisant saillie, par le maintien de la position du faisceau d'électrons constante.

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