Method for forming a patterned oxide superconductor thin film

Details Method for forming a patterned oxide superconductor thin film Method for forming a patterned oxide superconductor thin film

H - Electricity

01

L

H01L 39/24 (2006.01)

Patent

CA 2115716

A method for forming a patterned oxide superconductor thin film on a substrate comprises steps of forming a metal or semi-metal layer on a portion of the substrate, on which the oxide superconductor thin film will be formed, forming a layer of a material including silicon on a portion of the substrate, on which an insulating layer will be formed, removing the metal or semi metal layer and depositing an oxide superconductor thin film over the substrate.

L'invention est une méthode de formation de couches minces d'oxyde supraconducteur à configuration sur un substrat. Cette méthode comporte les opérations suivantes : formation d'une couche métallique ou semi-métallique sur une partie du substrat, sur laquelle la couche mince d'oxyde supraconducteur sera formée; formation d'une couche de matériau contenant du silicium sur une partie du substrat, sur laquelle une couche isolante sera formée; enlèvement de la couche métallique ou semi-métallique; et dépôt d'une couche mince d'oxyde supraconducteur sur le substrat.

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