C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 229/14 (2006.01) A61K 31/195 (2006.01) A61K 31/215 (2006.01) A61K 31/335 (2006.01) C07D 311/82 (2006.01) C07D 311/90 (2006.01) C07D 313/12 (2006.01) C07D 313/14 (2006.01)
Patent
CA 2106979
ABSTRACT Tricyclic compounds represented by the following formula: Image wherein X represents -CH=CH-, -CH2O-, or -O-; R' represents a lower alkyl group, R2 represents a hydrogen atom or a lower alkyl group; and n represents an integer of from 1 to 5, pharmacologically acceptable salts thereof, and a method for preparing the same. The present compounds have anti-allergic and anti-histaminic activities and reduced side effects, and are useful as anti-allergic agents and anti-histaminic agents. 3 9 -
Ito Yasuo
Kato Hideo
Koshinaka Eiichi
Morikawa Kouji
Ogawa Nobuo
Hokuriku Seiyaku Co. Ltd.
Johnson Douglas S. Q.c.
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