G - Physics – 01 – N
Patent
G - Physics
01
N
G01N 21/59 (2006.01) G01N 21/53 (2006.01) G01N 37/00 (2006.01) G03F 7/20 (2006.01)
Patent
CA 2366739
A method and apparatus is provided for measuring the below 300nm internal transmittance of an optical material (12) comprising measuring the transmittance of a below 300nm light source (14) through at least two different pathlengths (16, 16') within a single sample of the material. The below 300nm light is transmitted through two opposing surfaces of the sample, the two opposing surfaces being spaced apart in a non-parallel relationship. The invention provides improved measurements for below 300 nm optical microlithography.
L'invention concerne un procédé et un appareil pour mesurer la transmittance interne en dessous de 300 nm d'un matériau optique (12), qui consiste à mesurer la transmittance d'une source lumineuse en dessous de 300 nm (14) sur au moins deux longueurs différentes de trajet optique (16, 16') à l'intérieur d'un échantillon unique du matériau. La lumière en dessous de 300 nm est transmise à travers deux surfaces opposées de l'échantillon, les deux surfaces opposées étant écartées l'une de l'autre et non parallèles. L'invention permet d'effectuer des mesures en micro-lithographie optique en dessous de 300 nm.
Bucher Gregory L.
Logunov Stephan L.
Corning Incorporated
Gowling Lafleur Henderson Llp
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