System and method for wastewater treatment

C - Chemistry – Metallurgy – 02 – F

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C02F 1/42 (2006.01) C02F 1/00 (2006.01)

Patent

CA 2745089

The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a vacuum filter band system configured to receive a saturated resin tank from a front end system, the vacuum filter band system configured to generate a slurry from the saturated resin tank and to provide a cascading resin rinse to the slurry. The system may further include a repetitive stripping system configured to receive a metal-filled purifi-cation unit from a metal specific purification system. The repetitive stripping system may be further configured to se-quentially apply the contents of a plurality of acid tanks to the metal-filled purification unit to generate a metal salt. Numerous other embodiments are also within the scope of the present disclosure.

Linvention concerne des systèmes et des procédés de traitement deaux usées. Un système conforme à un mode de réalisation de linvention peut comprendre un système de bande de filtration sous vide conçu pour recevoir un réservoir de résine saturée provenant dun système frontal, le système de bande de filtration sous vide étant conçu pour produire une bouillie liquide à partir du réservoir de résine saturée et fournir un rinçage de résine en cascade à la boue liquide. Le système peut également comprendre un système de stripage répétitif qui reçoit une unité de purification remplie de métal provenant dun système de purification spécifique dun métal et qui peut appliquer séquentiellement les contenus dune pluralités de réservoirs dacide à unité de purification remplie de métal pour générer un sel de métal. Linvention concerne également dautres modes de réalisation de linvention.

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